Block copolymers [AB]x type of aminopropyl-terminated poly(dimethylsiloxane) (NH2-PDMS) and polyamides trichlorogermyl pendant group were prepared by a solution phase one pot polycondensation method. The prepared block copolymers were assembled with polyethylene-alt-(maleic) anhydride (PEMA) as multilayered thin film assembly through covalently linked Layer by Layer (LbL) technique using dipping method. The prepared thin films had thickness in the range of 15 to 20 nm as measured on an ellipsometer. In the systems where quartz was used as substrate, film growth after each deposition was monitored through UV-Vis spectrophotometer, which substantiated the multilayer film build-up. Atomic Force Microscopic (AFM) images showed homogeneous and robust film, which were strong enough to endure the force of 400 nN. As the block copolymers are thermally stable and have the capacity to absorb water, so their prepared robust ultra-thin films can show potential of thermally resistant nano thin films, protective hydrophilic coatings in addition to separation membranes.

Rohama Gill, Sadia Batool, Shahid Saeed Qureshi and Raziya Khalid